Near-Ideal van der Waals NbSe2 Contacts for WSe2 CMOS Electronics
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초록

Reliable, low-resistance contacts remain a central bottleneck in two-dimensional (2D) semiconductor devices, where Fermi-level pinning (FLP) at metal-semiconductor interfaces limits carrier injection and masks intrinsic transport. Here, we demonstrate that metallic van der Waals (vdW) contacts based on transferred NbSe2 enable near-ideal p-type operation in WSe2 field-effect transistors. Devices with NbSe2 contacts exhibit clear p-type characteristics, ohmic behavior, and high on/off ratios, in contrast to conventional high-work-function metal contacts. Temperature-dependent measurements reveal a reduced Schottky barrier height of similar to 0.06 eV, compared to similar to 0.26 eV for Pt contacts. Four-point-probe measurements confirm a low contact resistance and channel-dominated transport, evidencing efficient carrier injection across the vdW interface. Furthermore, a dopant-free complementary metal-oxide-semiconductor (CMOS) inverter is realized by integrating p-type NbSe2 and n-type Sb contacts on WSe2. These results establish metallic vdW contacts as an effective strategy to suppress FLP and enable high-performance 2D electronics.

키워드

2D semiconductorfield-effect transistorsvan der Waals contactFermi-level pinningINTEGRATIONTRANSISTORSTRANSITIONMOBILITYPLATFORM
제목
Near-Ideal van der Waals NbSe2 Contacts for WSe2 CMOS Electronics
저자
Choi, HyungyuSong, YunseoAli, NasirShin, HoseongYoon, Tae WoongJeong, InheePark, HyokwangSong, SeungukChoi, Min SupKang, BoseokYoo, Won Jong
DOI
10.1021/acs.nanolett.6c00871
발행일
2026-04-22
유형
Article
저널명
Nano Letters
26
15
페이지
5307 ~ 5313