ScholarWorks@성균관대학교

초록

This study examines the effects of O2 and CF4 plasma treatment on the surface morphology, structural, optical, and hydrophilic properties of single-crystal muscovite mica. X-ray diffraction reveals degradation of crystallographic order arising from plasma-induced defects. SEM analysis shows that prolonged O2 plasma exposure produces nanoscale etch holes, while CF4 plasma treatment generates both etch holes and etched nanocrystalline features, particularly at higher plasma power. Vibrational spectroscopy indicates defect- and disorder-related modifications in the silicate bonding environment. Optical measurements reveal a monotonic increase in the band gap for O2 plasma-treated mica, whereas CF4 plasma treatment results in a non-monotonic band gap variation. Mechanistically, O2 plasma induces surface-limited oxidation and defect-mediated etching, while CF4 plasma causes aggressive fluorination, interlayer disruption, and re-deposition, leading to extensive surface roughening.

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