ScholarWorks@성균관대학교

초록

Nitride-based materials have garnered significant attention for next-generation optoelectronic devices owing to their tunable properties, which enable innovative device applications. Among these, zinc tin nitride (ZTN) is promising because of its unique electronic and optical characteristics. Herein, we report the first successful fabrication and characterization of p-n homojunction devices based on amorphous ZTN thin films doped with group III elements (Al and Ga). The doped ZTN thin films were synthesized using a modified pulsed plasma-enhanced chemical vapor deposition (PECVD) method, allowing precise control over the injection of each precursor for tailored material properties. Systematic doping of p-type ZTN with varying dopant concentrations revealed tunable optical and electrical properties, including hole concentrations ranging from 1013 to 1018 cm−3, mobilities of ∼1–10 cm2/(V⋅s), bandgaps of 1.96–2.43 eV, work functions of 4.25–4.97 eV, and Fermi level modulation. The optimized ZTN-based homojunction device exhibited a rectification ratio of 102, which is attributed to band structure engineering of the p-type ZTN. This work highlights the potential of group III-doped ZTN as a scalable platform for high-performance optoelectronic devices and contributes to the advancement of nitride-based materials for next-generation devices.

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